NAS
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Maximum Yield Amino Acid-Producing Microorganism Developed with use of System Biotechnology
Maximum Yield Amino Acid-Producing Microorganism Developed with use of System Biotechnology
A team led by Sang-Yup Lee, a distinguished professor of Chemical and Biomolecular Engineering and chair professor of LG Chemical, has succeeded in developing maximum yield L-valine-producing microorganism by using System Biotechnology methods. The research results will be published at the April fourth week (April 23 - 27) edition of the Proceedings of the National Academy of Sciences (PNAS) of the USA.
Prof. Lee’s team has developed maximum yield amino acid-producing microorganism (target substance of L-valine, an essential amino-acid) by using microorganism E cell system and simulation methods.
His team produced initial producing microorganism by selectively operating necessary parts in colon bacillus genome and excavated preliminary target gene which is to newly be operated through transcriptome analysis using DNA chips. Then they performed a great amount of gene deletion experiment on computer by using MBEL979, E-cells of colon bacillus, and excavated secondary engineering targets. And they finally succeeded in developing maximum yield valine-producing microorganism that can extract 37.8 grams of valine from 100 grams of glucose by applying experiment results to the actual development of microorganism so as to achieve the optimization of metabolic flux in cells,
Prof. Lee said, “Since successfully used for the development of microorganism on a systematic system level, system biotechnology methods are expected to significantly contribute to the development of all biotechnology-relevant industries. At the beginning, we had huge obstacles in fusing IT and BT, but my team mates cleverly overcame such obstacles, hence I’m very proud of them.” The producing microorganism and its developing methods are pending international applications (PCT).
2007.04.26 View 17911 -
Professor Seong-Ihl Woo Develops New High-Speed Research Method
Professor Seong-Ihl Woo Develops New High-Speed Research Method
Reduce research periods and expenses for thin film materials several ten times
Posted on the online version of Proceedings of National Academy of Sciences of the United States of America (PNAS) on January 9
A team led by Seong-Ihl Woo, a professor of KAIST Department of Chemical & Biomolecular Engineering and the director of the Center for Ultramicrochemical Process Systems, has developed a high-speed research method that can maximize research performances and posted the relevant contents on the online version of Proceedings of National Academy of Sciences of the United States of America (PNAS), a distinguished scientific journal, on January 9, 2007.
Professor Woo’s team has developed a high-speed research method that can fabricate several tens or several thousands of thin films with different compositions (mixing ratio) at the same time and carry out structural analysis and performance evaluation more than ten times faster and accurately, which leads to the shortening of the research processes of thin film materials. This is an epoch-making method that can reduce research periods and expenses several ten times or more, compared to the previous methods.
The qualities of final products of electronic materials, displays, and semi-conductors depend on the features of thin film materials. Averagely, it takes about two weeks or longer to fabricate a functional thin film and analyze and evaluate its performances. In order to fabricate thin film materials in need successfully, more than several thousand times of tests are required.
The existing thin film-fabricating equipment is expensive one demanding high-degree vacuum, such as chemical vapor deposition, sputtering, physical vapor deposition, laser evaporation, and so on. In order to fabricate thin films of various compositions with this equipment, a several million won-worth target (solid-state raw material) and precursors (volatile organic metal compound) pricing several hundreds won per gram are required. Therefore, huge amount of experiment expense is demanded for fabrication of several ten thousands of thin films with various compositions.
Professor Woo’s team has developed ‘combinatorial droplet chemical deposition’ equipment, which does not demand high-degree vacuum and is automated by computers and robots, by using a new high-speed research measure. The equipment is priced at about 1/5 of the existing equipment and easy for maintenance.
This equipment uses cheap reagents, instead of expensive raw materials. Reagents necessary to form required compositions are dissolved in water or proper solvents, and then applied by high frequencies to make several micrometer-scaled droplets (fine liquid droplet). Theses droplets are moved by nitrogen and dropped onto a substrate, which is to be fabricated into a thin film, and then subsequent thermal treatment is applied to the substrate to fabricate a thin film of required composition. At this moment, several tens or several hundreds of thin films with various compositions can be fabricated at the same time by reducing the size of thin film specimens into millimeter scale with the use of shade mask and adjusting vaporization time with masks, the moving speed of which can be adjusted. The expenses for materials necessary for the fabrication of thin films with this equipment amount to several ten thousands won per 100 grams, which is in the range of 1/100 and 1/10 of the previous methods, and the research period can be shortened into one of several tenth.
“If this new method is applied to the development of elements in the fields of core energy, material and health, which have not been discovered by the existing research methods so far, as well as researches in thin film material field, substantial effects will be brought,” said Professor Woo.
‘Combinatorial droplet chemical vaporization’ equipment is pending a domestic patent application and international patent applications at Japan and Germany. This equipment will be produced by order and provided to general researchers.
2007.02.02 View 20750 -
Sungil Chung listed in Who's Who following last year
Sungil Chung listed in Who’s Who following last year
Sungil Chung, senior researcher of KAIST Satellite Technology Research Center (STRC), is listed in the international biographical dictionary Marquis Who"s Who’s Who’s Who in the America Edition 2007 following last year. He is also listed in the first edition of Who’s Who of Emerging Leaders.
Ph.D. Chung majored in Electrohydrodynamics (EHD) at Texas A&M University and worked at NASA’s Goddard Space Flight Center for a research in the field of aerospace vehicle-related thermal control. He has worked at KAIST STRC as senior researcher from September this year.
He has won an Innovation and Creativity Prize Paper Award from the U.S. Institute of Electrical and Electronics Engineers (IEEE) in 2004.
2006.11.16 View 21223